Tecnoflon® perfluoroelastomers’ combination of properties—wide service temperature ratings, resistance to aggressive acids, solvents, and bases, improved elastic recovery, excellent seal force retention, and outstanding contamination performance—ensures their success in the demanding world of wafer fabrication.
Unlike other elastomers which may outgas, leach, or otherwise contaminate operations, Tecnoflon perfluoroelastomers help maintain process purity and seal integrity.
In plasma and chemical vapor deposition applications, Tecnoflon perfluoroelastomers withstand long term exposure in etching, stripping and cleaning processes. In wet chemical operations, swelling due to prolonged chemical exposure and poor elastic recovery are frequent causes of seal failure. These inadequacies are eliminated with Tecnoflon perfluoroelastomers. The reliability of seals made from Tecnoflon perfluoroelastomers results in reduced wafer yield losses and lowered frequency of maintenance and operations disruptions. 

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Our Tecnoflon choices include Copolymers, Terpolymers, Low Temperature Polymers, Base Resistant Polymers, Peroxide Curable Polymers, Specialty Polymers and Perfluorinated Polymers.