Solvay Fluor offers a wide rage of high performance process gases for the semiconductor, LCD and solar industry. Our new range of products (Fluorine, Sifren®46 and COF2) is characterized by very low GWP values and helps to face the challenge of reducing the greenhouse emissions both in etching and cleaning processes.
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Ammonium Fluoride, 40 %,
10ppb Grade (C)
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Ammonium Fluoride, 40 %, 10 ppb Grade |
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Carbonyl Difluoride COF2
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Carbonyl difluoride has GWP=1 and can replace PFCs in chamber cleaning and in etching processes. This new product is now available in sample quantities. |
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Elemental Fluorine F2 (C)
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Elemental fluorine has GWP=0 and is the best performing CVD gas chamber cleaning. It allows reducing the cost of ownership of your tools, reducing gas consumption by having no greenhouse emissions! |
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Hydrofluoric Acid, 49 %,
1ppb Grade (C)
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Hydrofluoric Acid, 49 %, 1 ppb Grade |
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Hydrofluoric Acid, 49%,
10ppb Grade (C)
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Hydrofluoric Acid, 49%, 10 ppb Grade |
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Sulphur Hexafluoride SF6
SF6 e-grade
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SF6 is the most price competitive source of fluorine. It can be profitably used for cleaning and for etching. If used properly, it is possible to limit the emissions of your processes at very low levels. |
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Sifren® 46
C4F6 (E)
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C4F6 has a GWP=0 and it is the most advanced etching gas for critical applications. Its low C/F ratio and its insaturations allow achieving the highest aspect ratios in etching. |
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